Barrier Metal DPT Material Electrode Material Etch Hard Mask film GST Material Gap Fill Material High-k for Capacitor High-k for Metal Gate Low-k Metallization Metal SiO2 / SiN Electrode Material은 메모리소자에서 전자를 보관하는 Capacitor의 전극물질로써 Contact 저항이 낮으면서 구조적으로 튼튼한 물질이 요구됩니다. 최근까지는 TiN이 Bottom Electrode로 사용되고 있으나 선폭의 미세화로 Ru 및 Nb 물질이 연구 되고있습니다. PRODUCT Ru(EtCp)2 Bis(ethylcyclopentadienyl)Ruthenium 자세히보기 Ru-4 Ru(η6-p-Cymene)(η4-1,3-cyclohexadiene) 자세히보기 TBTDETa (t-butylimido)tris(diethylamido)Tantalum 자세히보기 TBTEMTa (t-butylimido)tris(ethylmethylamido)Tantalum 자세히보기 TDMAT Tetrakis(dimethylamido)titanium(IV) 자세히보기 TiCl4 Titanium tetrachloride 자세히보기 Ru(EtCp)2 Chemical name, Chemical formula, formula weight (g/mol), Boiling point (℃), Vapor pressure (℃/torr), Phase, Water reactivity Chemical name. Bis(ethylcyclopentadienyl)Ruthenium Chemical formula C14H18Ru formula weight (g/mol) 287.37 Boiling point (℃) - Vapor pressure (℃/torr) 90 / 0.34 Phase Liquid (Yellow) Water reactivity React slowly 닫기 Ru-4 Chemical name, Chemical formula, formula weight (g/mol), Boiling point (℃), Vapor pressure (℃/torr), Phase, Water reactivity Chemical name. Ru(η6-p-Cymene)(η4-1,3-cyclohexadiene) Chemical formula C16H22Ru formula weight (g/mol) 315.23 Boiling point (℃) 290 Vapor pressure (℃/torr) 134 / 1.0 Phase Yellow Liquid Water reactivity React slowly 닫기 TBTDETa Chemical name, Chemical formula, formula weight (g/mol), Boiling point (℃), Vapor pressure (℃/torr), Phase, Water reactivity Chemical name. (t-butylimido)tris(diethylamido)Tantalum Chemical formula C16H39N4Ta formula weight (g/mol) 468.46 Boiling point (℃) 95 / 0.5 Vapor pressure (℃/torr) 120 / 1.0 Phase Pale yellow liquid Water reactivity React violently 닫기 TBTEMTa Chemical name, Chemical formula, formula weight (g/mol), Boiling point (℃), Vapor pressure (℃/torr), Phase, Water reactivity Chemical name. (t-butylimido)tris(ethylmethylamido)Tantalum Chemical formula C13H33N4Ta formula weight (g/mol) 426.38 Boiling point (℃) 88 / 0.1 Vapor pressure (℃/torr) 95 / 1.8 Phase Pale yellow liquid Water reactivity React violently 닫기 TDMAT Chemical name, Chemical formula, formula weight (g/mol), Boiling point (℃), Vapor pressure (℃/torr), Phase, Water reactivity Chemical name. Tetrakis(dimethylamido)titanium(IV) Chemical formula C8H24N4Ti formula weight (g/mol) 224.18 Boiling point (℃) 225 Vapor pressure (℃/torr) 25 / 0.1 Phase Pale yellow liquid Water reactivity React violently 닫기 TiCl4 Chemical name, Chemical formula, formula weight (g/mol), Boiling point (℃), Vapor pressure (℃/torr), Phase, Water reactivity Chemical name. Titanium tetrachloride Chemical formula TiCl4 formula weight (g/mol) 189.69 Boiling point (℃) 136.4 Vapor pressure (℃/torr) 20 / 9.75 Phase Colorless liquid Water reactivity React violently 닫기
